Deposition of Zn-containing films using atmospheric pressure plasma jet

Logo poskytovatele
Logo poskytovatele

Varování

Publikace nespadá pod Pedagogickou fakultu, ale pod Přírodovědeckou fakultu. Oficiální stránka publikace je na webu muni.cz.
Autoři

GALMIZ Oleksandr STUPAVSKÁ Monika WULFF Harm KERSTEN Holger BRABLEC Antonín ČERNÁK Mirko

Rok publikování 2014
Druh Článek v odborném periodiku
Časopis / Zdroj Open chemistry
Fakulta / Pracoviště MU

Přírodovědecká fakulta

Citace
www https://doi.org/10.1515/chem-2015-0020
Doi http://dx.doi.org/10.1515/chem-2015-0020
Obor Fyzika plazmatu a výboje v plynech
Klíčová slova Atmospheric pressure plasma jet; film deposition; zinc.
Popis The aim of this work was to deposit Zn-containing films on Si substrates using the commercial atmospheric pressure plasma jet “kINPen’09”. In preliminary experiments Zn-containing films were deposited on the substrates immersed in water solutions of Zn(NO3)2.6H2O salt. The surface composition of deposited films was analyzed by XPS (X-ray photoelectron spectroscopy) technique while the bulk composition was studied by means of XRD (X-ray diffraction) mesurements. The film thickness was measured by a profilometer. We have found out, that the concentration of the zinc nitrate solution as well as changes in the deposition time result in a large fluctuation of the deposited film thickness. However, the successful deposition of the Zn-containing films on the Si substrate was definitely confirmed
Související projekty:

Používáte starou verzi internetového prohlížeče. Doporučujeme aktualizovat Váš prohlížeč na nejnovější verzi.