Determination of titanium atom and ion densities in sputter deposition plasmas by optical emission spectroscopy

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Publikace nespadá pod Pedagogickou fakultu, ale pod Přírodovědeckou fakultu. Oficiální stránka publikace je na webu muni.cz.
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VAŠINA Petr FEKETE Matej HNILICA Jaroslav KLEIN Peter DOSOUDILOVÁ Lenka DVOŘÁK Pavel NAVRÁTIL Zdeněk

Rok publikování 2015
Druh Článek v odborném periodiku
Časopis / Zdroj Plasma Sources Science and Technology
Fakulta / Pracoviště MU

Přírodovědecká fakulta

Citace
www http://iopscience.iop.org/article/10.1088/0963-0252/24/6/065022
Doi http://dx.doi.org/10.1088/0963-0252/24/6/065022
Obor Fyzika plazmatu a výboje v plynech
Klíčová slova sputter species density; magnetron; HIPIMS; plasma diagnostics; titanium
Popis The thorough characterizations of deposition plasma lead to important achievements in the fundamental understanding of the deposition process, with a clear impact on the development of technology. Measurement of the spatial and, in the case of pulse excited plasma, also temporal evolution, of the concentrations of sputtered atoms and ions is a primary task in the diagnostics of any sputter deposition plasma. However, it is difficult to estimate absolute number densities of the sputtered species (atoms and ions) in ground states directly from optical emission spectroscopy, because the species in the ground levels do not produce any optical signal. A method using effective branching fractions enables us to determine the density of non-radiating species from the intensities of self-absorbed spectral lines. The branching fractions method described in the first part of this paper was applied to determine the ground state densities of the sputtered titanium atoms and ions. The method is based on fitting the theoretically calculated branching fractions to experimentally measured ratios of the relative intensities of carefully selected resonant titanium atomic and ionic lines. The sputtered species density is determined in our experimental setup with a relative uncertainty of less than 5% for the dc driven magnetron and typically 15% for time-resolved measurements of high- power impulse magnetron sputtering (HiPIMS) discharge. In the second part of the paper, the method was applied to determine the evolution of titanium atom and ion densities in three typical cases ranging from the dc driven sputter process to HiPIMS.
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