Pulsed-DC Magnetron Sputtering Process for Low Temperature Deposition of Hard Yet Moderately Ductile MoBC Coatings
| Autoři | |
|---|---|
| Rok publikování | 2016 |
| Druh | Konferenční abstrakty |
| Fakulta / Pracoviště MU | |
| Citace | |
| Popis | Current state-of- materials nowadays used as protective coatings such as TiN, TiAlN, c-BN etc. generally exhibit high hardness and high stiffness. These positive features are often accompanied by undesirable brittle deformation behaviour. To overcome this limitation a new generation of materials with high hardness coupled with moderate ductility is desired. |
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