Deposition of Nanostructured Diamond-Like Carbon Films in Dual Frequency Capacitive Discharge

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Publikace nespadá pod Pedagogickou fakultu, ale pod Přírodovědeckou fakultu. Oficiální stránka publikace je na webu muni.cz.
Název česky Depozice nanostrukrurovaných diamantu podobných uhlíkových vrstev v kapacitním výboji s dvojí frekvencí
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BURŠÍKOVÁ Vilma PEŘINA Vratislav SOBOTA Jaroslav KLAPETEK Petr DVOŘÁK Pavel STOICA Adrian BURŠÍK Jiří FRANTA Daniel

Rok publikování 2008
Druh Článek ve sborníku
Konference 19th Europhysics Conference on the Atomic and Molecular Physics of Ionized Gases
Fakulta / Pracoviště MU

Přírodovědecká fakulta

Citace
Obor Fyzika plazmatu a výboje v plynech
Popis The aim of the present work was to deposit nanostructured diamond-like carbon (NDLC) coatings with various admixtures (silicon, oxygen, nitrogen, tungsten etc.) on several different substrate materials (silicon, glass, polycarbonate and steel) in dual frequency capacitive r.f. discharges. For the plasma diagnostics the optical emission spectroscopy, capacitively coupled planar ion flux probe measurements and gas chromatography with mass spectrometry of stable plasma products were used. The structure of the prepared films was studied with infrared absorption spectroscopy (FTIR) and X-ray photoelectron spectroscopy. Complete atomic compositions, including hydrogen content and film densities, were determined by combination of RBS and ERD analyses. The complex dielectric function of the films was determined from ellipsometric measurements in the range from 1.5 to 6.5 eV. Laser Desorption-Ionisation – Time of Flight Mass Spectrometry (LDI-TOF) was used to study the deposited films. It was found that LDI-TOF mass spectrometry can serve as a rapid tool for the characterisation of NDLC layers with different admixtures. The mechanical properties of prepared coatings (e.g. hardness, elastic modulus, fracture toughness, coating/substrate adhesion etc.) were studied by means of indentation techniques using Fischerscope H100 tester, Nanoindentor XP with CSM option and ultrananoindentor UNHT (CSM).
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