Nucleation and initial growth of atomic layer deposited titanium oxide determined by spectroscopic ellipsometry and the effect of pretreatment by surface barrier discharge
| Authors | |
|---|---|
| Year of publication | 2015 |
| Type | Article in Periodical |
| Magazine / Source | Applied Surface Science |
| MU Faculty or unit | |
| Citation | |
| Web | http://www.sciencedirect.com/science/article/pii/S016943321500731X |
| Doi | http://dx.doi.org/10.1016/j.apsusc.2015.03.135 |
| Field | Plasma physics |
| Keywords | Atomic layer deposition; Spectroscopic ellipsometry; Quantum confinement effects; Nucleation density |
| Description | This paper reports on the use of spectroscopic ellipsometry to characterise the initial nucleation stage of the atomic layer deposition of the anatase phase of titanium dioxide on silicon substrates. |
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