Low temperature temporal and spatial atomic layer deposition of TiO2 films

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Authors	AGHAEE Morteza MAYDANNIK Philipp JOHANSSON Petri KUUSIPALO Jurkka CREATORE Mariadriana HOMOLA Tomáš CAMERON David Campbell
Year of publication	2015
Type	Article in Periodical
Magazine / Source	Journal of Vacuum Science & Technology A
MU Faculty or unit	Faculty of Science
Citation
Web	http://scitation.aip.org/content/avs/journal/jvsta/33/4/10.1116/1.4922588
Doi	http://dx.doi.org/10.1116/1.4922588
Field	Solid matter physics and magnetism
Keywords	ALD
Description	Titanium dioxide films were grown by atomic layer deposition (ALD) using titanium tetraisopropoxide as a titanium precursor and water, ozone, or oxygen plasma as coreactants.
Related projects:	CEPLANT - Regionální VaV centrum pro nízkonákladové plazmové a nanotechnologické povrchové úpravy Rozvoj centra pro nízkonákladové plazmové a nanotechnologické povrchové úpravy