Technologie pro depozici materiálu napařováním
| Title in English | Technology for thin film deposition by arc |
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| Authors | |
| Year of publication | 2019 |
| MU Faculty or unit | |
| Description | The proposed technology shows that the use of a DC arc leads to more than twice as fast layer deposition as a pulsed arc, making the process much more efficient and less energy-consuming. However, using a pulsed arc, the ion flux is increased by almost one order, resulting in higher quality layers (lower roughness or greater density), resulting in the higher added value of the layers. |
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