Deposition and characterization of organosilicon thin films from TEOS+O2 gas mixture

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Authors	JANČA Jan KRYŠTOF P. NAVRÁTIL Karel BOCHNÍČEK Zdeněk NĚMEC Petr
Year of publication	1995
Type	Article in Periodical
Magazine / Source	Acta Physica Univesitatis Comenianae
MU Faculty or unit	Faculty of Science
Citation
Field	Plasma physics
Related projects:	Study of plasmachemical reactions in non-isothermic low pressure plasma and its interaction with the surface of solid substrates