Depozice a charakterizace tenkých vrstev připravených ze směsi TEOS+O2 ve vf plazmatu

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Title in English	RF plasma deposition and characterization of organosilicon thin films from TEOS + O2 gas mixture
Authors	JANČA Jan NAVRÁTIL Karel BOCHNÍČEK Zdeněk
Year of publication	1995
Type	Chapter of a book
MU Faculty or unit	Faculty of Science
Citation
Related projects:	Study of plasmachemical reactions in non-isothermic low pressure plasma and its interaction with the surface of solid substrates