Plasma Enhanced Chemical Vapour Deposition of Thin Films from Tetraethoxysilane and Methanol: Optical Properties and XPS Analyses

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Authors

ZAJÍČKOVÁ Lenka OHLÍDAL Ivan JANČA Jan

Year of publication 1996
Type Article in Periodical
Magazine / Source Thin Solid Films
MU Faculty or unit

Faculty of Science

Citation
Field Plasma physics
Keywords PECVD; TEOS
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