Plasma enhanced chemical vapor deposition of silicon incorporated diamond-like carbon films

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Authors

BURŠÍKOVÁ Vilma ZAJÍČKOVÁ Lenka DVOŘÁK Pavel SUBEDI Deepak Prasad JANČA Jan

Year of publication 2000
Type Article in Proceedings
Conference Abstracts of Invited Lecturers and Contributed Papers ,XVth Europhysics Conference on Atomic and Molecular Physics of Ionized Gases
MU Faculty or unit

Faculty of Science

Citation
Field Plasma physics
Keywords PECVD; Diamond-like Carbon; Protective thin films; Silicon doping;
Description Deposition of diamond like films with an incorporation of silicon by plasma enhanced CVD technique from mixture of methane, argon and hexamethyldisiloxane (HMDSO). Study of the influence of the percentage of HMDSO in the mixture on film properties.
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