Influence of Discharge Parameters on Composition of Films Deposited by PECVD from Hexamethyldisiloxane/Oxygen Mixtures

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Authors

ZAJÍČKOVÁ Lenka PEŘINA Vratislav BURŠÍKOVÁ Vilma MACKOVÁ Anna JANČA Jan

Year of publication 2000
Type Article in Proceedings
Conference Abstracts of Invited Lectures and Contributed Papers, XVth Europhysics Conference on Atomic and Molecular Physics of Ionized Gases
MU Faculty or unit

Faculty of Science

Citation
Field Plasma physics
Keywords Thin Films; PECVD; Hexamethyldisiloxane; RF discharge; RBS; ERD; FTIR; Polycarbonate
Description The composition of films, deposited from hexamethyldisiloxane/oxygen mixtures was studied by FTIR transmittance measurements, Rutherford backscattering method (RBS) and elastic recoil detection (ERD). Films were characterized by the ellipsometry, the morphology of the film surfaces was studied by SEM and the mechanical properties of films were characterized by Vickers indentation technique.
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