The deposition process based on silicon-organic compounds (HMDSO, TEOS) in two different types of an atmospheric barrier discharge

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Authors

SONNENFELD Axel TUN T. M. ZAJÍČKOVÁ Lenka WAGNER Hans-Erich BEHNKE J. B. HIPPLER R.

Year of publication 2001
Type Article in Proceedings
Conference Proceedings of 15th International Symposium on Plasma Chemistry
MU Faculty or unit

Faculty of Science

Citation
Field Plasma physics
Description The deposition process based on silicon-organic compounds (HMDSO, TEOS) in two different types of an atmospheric barrier discharge
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