Deposition Process Based on Organosilicon Precursors in Dielectric Barrier Discharges at Atmospheric Pressure - A Comparison

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Authors

SONNENFELD Axel TUN T. M. ZAJÍČKOVÁ Lenka KOZLOV K. V. WAGNER H.-E. BEHNKE J. F. HIPPLER R.

Year of publication 2001
Type Article in Periodical
Magazine / Source Plasmas and Polymers
MU Faculty or unit

Faculty of Science

Citation
Field Plasma physics
Keywords DBD
Description Deposition Process Based on Organosilicon Precursors in Dielectric Barrier Discharges at Atmospheric Pressure - A Comparison
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