Comparison of the ionization efficiency of two ionized physical vapour deposition processes: magnetron discharge assisted by microwave plasma or radio-frequency plasma

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Authors

DE POUSQUES Ludovic IMBERT Jean-Christiphe VAŠINA Petr BOISSE-LAPORTE Caroline TEULE-GAY Lionel TOUZEAU Michel

Year of publication 2004
Type Article in Proceedings
Conference Prosseding of Ninth International Conference on Plasma Surface Engineering
MU Faculty or unit

Faculty of Science

Citation
Field Plasma physics
Keywords IPVD; microwave; RF; magnetron
Description The objective of this work is to compare two IPVD processes developed in our laboratory, in particular the ionization efficiency of each system
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