Měření mechanického napětí v tenkých vrstvách pomocí kombinované optické metody
| Title in English | Measurement of mechanical stress in thin films using combined optical method |
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| Authors | |
| Year of publication | 2005 |
| Type | Article in Periodical |
| Magazine / Source | Jemná mechanika a optika |
| MU Faculty or unit | |
| Citation | |
| Web | http://hydra.physics.muni.cz/~franta/bib/JMO2005_72.html |
| Field | Solid matter physics and magnetism |
| Keywords | DLC thin films; mechanical stress; double-beam interferometry |
| Description | In this paper an optical method enabling us to measure the mechanical stress in thin films is decribed. This method is based on determination of the curvature radii of the substrates curved originating in consequence of the existence of the stresses inside the films created onto these substrates. The stess values are calculated using the modified Stoney formula. The thin film thicknesses needed for calculating the stresses are determined by means of the method based on interpretation of the experimental data obtained using multiple angle spectroscopic ellipsometry and spectroscopic reflectometry. This combined optical method is utilized for determination of the mechanical stresses in the DLC (diamond-like carbon) films prepared onto the substrates consisting of silicon single crystal containing impurities Si and O. In the paper the dependence of the stress inside these films on the values of ratio of the flow rates of hexamethyldisoloxane (HMDSO) and methane. |
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