Comparison of the ionisation efficiency in a microwave and a radio-frequency assisted magnetron discharge

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Authors	DE POUCQUES Ludovic IMBERT Jean-Christophe VAŠINA Petr BOISSE-LAPORTE Caroline TEULÉ-GAY Lionel BRETAGNE Jean TOUZEAU Michel
Year of publication	2005
Type	Article in Periodical
Magazine / Source	Surface and Coating Technology
MU Faculty or unit	Faculty of Science
Citation
Field	Plasma physics
Keywords	IPVD; sputtering; magnetron discharge; microwave discharge; RF discharge; absorption spectroscopy
Description	Comparison of two sources of ionisation in an IPVD reactor, microwave and RF discharge.
Related projects:	Study and application of plasma chemical reactions in non-isothermic low temperature plasma and its interaction with solid surface Pokročilé směry ve fyzice a chemii plazmatu