Preionised pulsed magnetron discharges for ionised physical vapour deposition

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Authors

GANCIU Mihai KONSTANTINIDIS Stephanos PAINT Yoann DAUCHOT Jean-Pierre HECQ Michel DE POUCQUES Ludovic VAŠINA Petr MEŠKO Marcel IMBERT Jean-Christophe BRETAGNE Jean TOUZEAU Michel

Year of publication 2005
Type Article in Periodical
Magazine / Source Journal of Optoelectronics and Advanced Materials
MU Faculty or unit

Faculty of Science

Citation
Field Plasma physics
Keywords pulsed magnetron; preionization; transport processes
Description To improve the quality of thin film deposition by magnetron discharges, particularly by an effective ionisation of the sputtered vapour, we developed a new ionised physical vapour deposition (IPVD) method based on preionised Pulsed magnetron discharges. By superposition of continuous, microwave or RF discharge, with a fast pulsed abnormal discharge, target current density is extended to very high values during short pulses. Efficient vapour ionisation is obtained and due to the current pulse shortness, electric arc development is avoided.
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