Preionised pulsed magnetron discharges for ionised physical vapour deposition

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Authors	GANCIU Mihai KONSTANTINIDIS Stephanos PAINT Yoann DAUCHOT Jean-Pierre HECQ Michel DE POUCQUES Ludovic VAŠINA Petr MEŠKO Marcel IMBERT Jean-Christophe BRETAGNE Jean TOUZEAU Michel
Year of publication	2005
Type	Article in Periodical
Magazine / Source	Journal of Optoelectronics and Advanced Materials
MU Faculty or unit	Faculty of Science
Citation
Field	Plasma physics
Keywords	pulsed magnetron; preionization; transport processes
Description	To improve the quality of thin film deposition by magnetron discharges, particularly by an effective ionisation of the sputtered vapour, we developed a new ionised physical vapour deposition (IPVD) method based on preionised Pulsed magnetron discharges. By superposition of continuous, microwave or RF discharge, with a fast pulsed abnormal discharge, target current density is extended to very high values during short pulses. Efficient vapour ionisation is obtained and due to the current pulse shortness, electric arc development is avoided.
Related projects:	Study and application of plasma chemical reactions in non-isothermic low temperature plasma and its interaction with solid surface Pokročilé směry ve fyzice a chemii plazmatu