Deposition of protective couatings in RF organosilicon discharges

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Authors	ZAJÍČKOVÁ Lenka BURŠÍKOVÁ Vilma FRANTA Daniel KUČEROVÁ Zuzana BOUSQUET Angelique GOULLET Antoine GRANIER Agnes
Year of publication	2006
Type	Article in Proceedings
Conference	In Abstracts of Invited Lectures and Contributed Papers, 18th Europhysics Conference on Atomic and Molecular Physics of Ionized Gases
MU Faculty or unit	Faculty of Science
Citation
Field	Plasma physics
Keywords	deposition-organosilicon-discharge
Description	The aim of the present paer was to study the deposition of protective coatings in RF organosilicon discharges.
Related projects:	Study and application of plasma chemical reactions in non-isothermic low temperature plasma and its interaction with solid surface Synthesis of new Si-O(N)-C materials by plasmachemical methods