UV light enhanced oxidation of a-C:H thin film in air: A study of thickness reduction

Warning

This publication doesn't include Faculty of Education. It includes Faculty of Science. Official publication website can be found on muni.cz.

Authors	VALTR Miroslav KLAPETEK Petr OHLÍDAL Ivan FRANTA Daniel
Year of publication	2007
Type	Article in Periodical
Magazine / Source	Optoelectronics and Advanced Materials - Rapid Communications
MU Faculty or unit	Faculty of Science
Citation
Web	http://inoe.inoe.ro/oam-rc/
Field	Plasma physics
Keywords	Amorphous carbon;Thin film;Optical properties;a-C:H;UV enhanced oxidation;Reflectance spectra
Description	UV light enhanced oxidation of a-C:H thin film in air: A study of thickness reduction.
Related projects:	Study and application of plasma chemical reactions in non-isothermic low temperature plasma and its interaction with solid surface Nanometrologie využívající metod rastrovací sondové mikroskopie