Nanoindentation studies on amorphous carbon films prepared using plasma enchanced chemical vapor deposition

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Authors

BURSIKOVA Vilma VALTR Miroslav KLAPETEL Petr BURSIK Jiri BLAHOVA Olga OHLIDAL Ivan

Year of publication 2008
Type Conference abstract
MU Faculty or unit

Faculty of Science

Citation
Description In the past two decades, there is a great industrial interest in preparation of amorphous hydrogenated carbon (a-C:H) thin films in a wide range of applications such as nanoelectronics, optical devices, integrated digital circuits, micro-electromechanical devices (MEMs), biomedical coatings, etc. The mechanical properties such as hardness, wear resistance, fracture toughness, film-substrate adhesion, thermo-mechanical stability of the coating-substrate system play always a crucial role for industrial applications of the films.
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