Preparation and characterisation of carbon films prepared from HMDSZ/Methane/Nitrogen or Hydrogen mixture using PECVD

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Authors	KELAR Lukáš BURŠÍKOVÁ Vilma BOCHNÍČEK Zdeněk
Year of publication	2008
Type	Conference abstract
MU Faculty or unit	Faculty of Science
Citation
Description	Carbon films are often used in various applications. In case of HDLC (amorphous hydrogenated carbon) there may be a problem with internal stress in the film, which can cause cracking or delamination of all the film. It is known that silicon incorporation into the film decreases the internal stress in the film. The aim of the present work was to study the effect of the negative self-bias voltage and the HMDSZ (Si2NC6H19) content in the deposition mixture on the properties of thin films prepared from HMDSZ/methane/nitrogen or hydrogen or argon mixtures.
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