Povrchová plazmová úprava krystalických křemíkových desek určených pro výrobu solárních článků

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Title in English	Plasma treatment of crystalline silicon wafers for production of solar cells
Authors	SKÁCELOVÁ Dana SŤAHEL Pavel HANIČINEC Martin BAŘINKOVÁ Pavlína ČERNÁK Mirko
Year of publication	2010
Type	Article in Proceedings
Conference	Sborník příspěvků z 5. České fotovoltaické konference
MU Faculty or unit	Faculty of Science
Citation
Field	Plasma physics
Keywords	Crystalline silicon atmospheric pressure plasma surface modification
Description	Contribution focused to application of atmospheric plasma in semiconductor industry, especially in production of solar cells. Plasma modification of surface properties of silicon wafers by DCSBD was investigated. This process makes all surfaces totaly wettable. Surface free energy was studied by contact angle measurement.
Related projects:	Study and application of plasma chemical reactions in non-isothermic low temperature plasma and its interaction with solid surface Preparation of nano-films and nano-coatings on textiles using plasma surface treatment at atmospheric pressure