Povrchová plazmová úprava krystalických křemíkových desek určených pro výrobu solárních článků

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Title in English Plasma treatment of crystalline silicon wafers for production of solar cells
Authors

SKÁCELOVÁ Dana SŤAHEL Pavel HANIČINEC Martin BAŘINKOVÁ Pavlína ČERNÁK Mirko

Year of publication 2010
Type Article in Proceedings
Conference Sborník příspěvků z 5. České fotovoltaické konference
MU Faculty or unit

Faculty of Science

Citation
Field Plasma physics
Keywords Crystalline silicon atmospheric pressure plasma surface modification
Description Contribution focused to application of atmospheric plasma in semiconductor industry, especially in production of solar cells. Plasma modification of surface properties of silicon wafers by DCSBD was investigated. This process makes all surfaces totaly wettable. Surface free energy was studied by contact angle measurement.
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