Confidence interval for the distance of two micro/nano structures and its applications in dimensional metrology
| Authors | |
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| Year of publication | 2011 |
| Type | Article in Proceedings |
| Conference | Measurement 2011, Proceedings of the 8th International Conference on Measurement |
| MU Faculty or unit | |
| Citation | |
| Field | Applied statistics, operation research |
| Keywords | Length Comparator; Dimensional Metrology; Confidence Intervals |
| Description | We propose a method for computing an approximate (Bonferroni type) confidence interval for the distance of two micro- and/or nanostructures considered in dimensional metrology, e.g. grating lines, using data obtained by a length comparator, which allows to determine the coordinates of the edges, the position and the width of the structure from its photometric profile together with the related uncertainty contributions. The implementation is demonstrated using data obtained by the Nanometer Comparator operated at the PTB Braunschweig, Germany. |
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