Principles and practice of an automatic process control for the deposition of hard nc-TiC/a-C:H coatings by hybrid PVD-PECVD under industrial conditions

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Publikace nespadá pod Pedagogickou fakultu, ale pod Přírodovědeckou fakultu. Oficiální stránka publikace je na webu muni.cz.
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ŽEMLIČKA Radek JÍLEK Mojmír VOGL Petr ŠRÁMEK Jaroslav SOUČEK Pavel BURŠÍKOVÁ Vilma VAŠINA Petr

Rok publikování 2016
Druh Článek v odborném periodiku
Časopis / Zdroj Surface & coatings technology
Fakulta / Pracoviště MU

Přírodovědecká fakulta

Citace
www http://www.sciencedirect.com/science/article/pii/S0257897216305539
Doi http://dx.doi.org/10.1016/j.surfcoat.2016.06.061
Obor Fyzika plazmatu a výboje v plynech
Klíčová slova Nanocomposites; Magnetron sputtering; Process control; Mechanical properties; Titanium-carbon coatings; DLC; Industrial process
Popis A study of a hybrid PVD-PECVD process of sputtering a titanium target in an argon/acetylene gas mixture was performed. This process was used for the deposition of nanocomposite coatings consisting of titanium carbide grains embedded in an amorphous hydrogenated carbon matrix (nc-TiC/a-C:H). The study was performed under industrial conditions employing a large-scale deposition device with a cylindrical sputtering cathode. When the acetylene supply was gradually increased, a discharge voltage drop and total pressure saturation simultaneously occurred at a certain acetylene supply. The hardest coatings were found always to be deposited at the acetylene supply corresponding to these deposition conditions. However, the acetylene supply to detect the voltage drop and pressure saturation was determined to be dependent on the cathode thickness. A fully automatic procedure suitable for the preparation of hard nc-TiC/a-C:H coatings by the hybrid PVD-PECVD process was proposed in this paper. This approach ensured that the optimal deposition setting was consistently found for the deposition process independent of the cathode thickness. The procedure was thoroughly tested, and it was demonstrated to be reliable and robust. Furthermore, the algorithm ensured the deposition of coatings with the same composition and the same high hardness throughout the cathode lifetime.
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