XPS and Ellipsometric Study of DLC/Silicon Interface

Logo poskytovatele
Logo poskytovatele

Varování

Publikace nespadá pod Pedagogickou fakultu, ale pod Přírodovědeckou fakultu. Oficiální stránka publikace je na webu muni.cz.
Autoři

ZAJÍČKOVÁ Lenka VELTRUSKÁ Kateřina TSUD Nataliya FRANTA Daniel

Rok publikování 2001
Druh Článek v odborném periodiku
Časopis / Zdroj Vacuum
Fakulta / Pracoviště MU

Přírodovědecká fakulta

Citace
www http://hydra.physics.muni.cz/~franta/bib/VAC61_269.html
Obor Fyzika plazmatu a výboje v plynech
Klíčová slova DLC films; XPS; Ellipsometry; Interface
Popis Diamond-like carbon (DLC) films were prepared by plasma enhanced CVD from the mixture of methane and argon on silicon substrates. Films were characterized by multi-sample modification of variable angle spectroscopic ellipsometry. The ellipsometry showed that there is a transition interlayer between the DLC film and the silicon substrate that cannot be attributed to a thin silicon dioxide layer but rather to amorphous silicon and/or modified oxide layer. TRIM calculations revealed that argon or carbon ions could not produce a significant layer of amorphous silicon because the depth of target atom displacements is bellow the thickness of a native oxide layer. The chemical composition of a DLC film profile including a DLC/silicon interface was studied by X-ray photoelectron spectroscopy (XPS) coupled with an argon sputtering of the 34 nm thick DLC film. The DLC/silicon interface composed from less than 6 % of oxygen and gradually decreasing and increasing carbon and silicon percentage, respectively.
Související projekty:

Používáte starou verzi internetového prohlížeče. Doporučujeme aktualizovat Váš prohlížeč na nejnovější verzi.