Comparison of AFM and optical methods at measuring nanometric surface roughness

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Authors	OHLÍDAL Ivan FRANTA Daniel OHLÍDAL Miloslav VIČAR Martin KLAPETEK Petr
Year of publication	1998
Type	Article in Proceedings
Conference	Proceedings of the 3th Seminar on Quantitative Microscopy
MU Faculty or unit	Faculty of Science
Citation
Web	http://hydra.physics.muni.cz/~franta/bib/PTBF34_123.html
Field	Solid matter physics and magnetism
Description	In this contribution a comparison of the values of basic quantities characterizing random nanometric surface roughness determined by AFM and optical methods is presented.
Related projects:	Common laboratories for applied plasma physics and plasma chemistry in PřF and PedF MU, VA Brno and ÚFP AV ČR in Prague Design and construction of the equipment for in-situ measurement of thin film surface homogeneity Characterization of multilayer systems with randomly rough boundaries by means of optical and X - ray methods