Higher harmonic frequencies in capacitive discharges and their using for monitoring of plasma processing

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Authors	ŽEMLIČKA Radek DVOŘÁK Pavel BURŠÍKOVÁ Vilma
Year of publication	2012
Type	Article in Proceedings
Conference	Potential and Application of Surface Nanotreatment of Polymers and Glass: Book of Extended Abstrakts 2012
MU Faculty or unit	Faculty of Science
Citation
Field	Plasma physics
Keywords	higher harmonics; RF discharge; plasma processing
Description	Waveforms of discharges voltage and current and their changes due to changes of plasma parameters were studied recently. Mainly the sensitive reaction of Fourier components of discharge voltage to presence of deposited or etched thin films showed up as an useful diagnostic method of plasma processing.
Related projects:	CEPLANT - Regionální VaV centrum pro nízkonákladové plazmové a nanotechnologické povrchové úpravy