Higher harmonic frequencies in capacitive discharges and their using for monitoring of plasma processing

Investor logo

Warning

This publication doesn't include Faculty of Education. It includes Faculty of Science. Official publication website can be found on muni.cz.
Authors

ŽEMLIČKA Radek DVOŘÁK Pavel BURŠÍKOVÁ Vilma

Year of publication 2012
Type Article in Proceedings
Conference Potential and Application of Surface Nanotreatment of Polymers and Glass: Book of Extended Abstrakts 2012
MU Faculty or unit

Faculty of Science

Citation
Field Plasma physics
Keywords higher harmonics; RF discharge; plasma processing
Description Waveforms of discharges voltage and current and their changes due to changes of plasma parameters were studied recently. Mainly the sensitive reaction of Fourier components of discharge voltage to presence of deposited or etched thin films showed up as an useful diagnostic method of plasma processing.
Related projects:

You are running an old browser version. We recommend updating your browser to its latest version.