Influence of hydrogen on behaviour of reactive magnetron sputtering

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Authors

NEKVAPIL Jakub VAŠINA Petr SCHMIDTOVÁ Tereza

Year of publication 2012
Type Article in Proceedings
Conference Potential and Applications of Surface Nanotreatment of Polymers and Glass: Book of Extended Abstracts
MU Faculty or unit

Faculty of Science

Citation
Field Plasma physics
Keywords reactive magnetron sputtering; hydrogen
Description This work studies reactive magnetron sputtering in mixtures of the gases Ar, O2 and H2. The main part is formed by analyzes the hysteresis of the deposition process for the mixtures Ar+O2, Ar+H2 separately and comparison of the results with behaviour of the system for the Ar+O2+H2 mixture. Behaviour of the system is studied for the case of deposition titanium oxide layer.
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