Growth temperature dependent strain in relaxed Ge microcrystals
| Authors | |
|---|---|
| Year of publication | 2018 |
| Type | Article in Periodical |
| Magazine / Source | Thin Solid Films |
| MU Faculty or unit | |
| Citation | |
| Doi | http://dx.doi.org/10.1016/j.tsf.2018.08.033 |
| Keywords | Patterned substrates; Silicon substrates; Germanium; Nanocrystals; X-ray diffraction; Crystal Defects; Low energy plasma enhanced chemical vapor deposition |
| Description | Using high resolution X-ray diffraction with reciprocal space mapping, we obtain the lattice parameters, strain and degree of relaxation at different growth temperatures of microcrystals. |
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