A New Approach to the Crystallization of Perovskite Films by Cold Hydrogen Atmospheric Pressure Plasma
| Authors | |
|---|---|
| Year of publication | 2020 |
| Type | Article in Periodical |
| Magazine / Source | Plasma Chemistry and Plasma Processing |
| MU Faculty or unit | |
| Citation | |
| Web | https://doi.org/10.1007/s11090-020-10059-1 |
| Doi | http://dx.doi.org/10.1007/s11090-020-10059-1 |
| Keywords | Hydrogen plasma; Perovskite; Chemical composition; Plasma-chemical modification; Crystallization |
| Description | This contribution presents a new approach to rapid and low-temperature plasma-chemical crystallization of perovskite films. Chlorine-incorporated perovskite (MAPbI(3-x)Cl(x)) films were exposed to diffuse atmospheric hydrogen (H-2) plasma immediately after their deposition. Several types of surface characterization techniques were used to investigate the effect of the H-2 plasma on the surface of the perovskite films. Since the H-2 plasma was generated at a low temperature (<= 70 degrees C), there was no considerable damage to the plasma-treated perovskite films-although the morphology and chemistry changed significantly. H-2 plasma had a range of effects on the surface of the perovskite films: (1) changes in the chemical composition of the perovskite surface without removal of lead; (2) modification of the optoelectrical band structure; (3) crystallization of the perovskite film; and (4) the grain of the surface became highly ordered. The results presented demonstrate that H-2 plasma is a rapid and low-cost method for the manufacture of crystallized perovskite films. The method may be considered a significant step towards low-temperature, annealing-free crystallization of perovskite films. |
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