Diamond Growth on silicon and WC-Co by microwave plasma chemical vapor deposition

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Authors	FRGALA Zdeněk KUDRLE Vít JANČA Jan BURŠÍKOVÁ Vilma VAŠINA Petr MEŠKO Marcel BURŠÍK Jiří KADLEČÍKOVÁ M. KLAPETEK Petr
Year of publication	2003
Type	Article in Proceedings
Conference	Proceedings of contributed papers WDS'03
MU Faculty or unit	Faculty of Informatics
Citation
Field	Plasma physics
Keywords	PECVD; diamond; WC; raman spectra; SEM
Description	Diamond Growth on silicon and WC=Co by microwave plasma chemical vapor deposition
Related projects:	Study of plasmachemical processes using microwave and optical spectroscopy Plasmachemical depositions and plasmachemical treatment of surfaces of solid state substrate Study of plasmachemical reactions in non-isothermic low pressure plasma and its interaction with the surface of solid substrates