Analytical electron microscopy of plasma deposited carbon nanostructures

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Authors

BURŠÍK Jiří ELIÁŠ Marek JAŠEK Ondřej KUDRLE Vít BUBLAN Martin ZAJÍČKOVÁ Lenka

Year of publication 2005
Type Article in Proceedings
Conference Proceedings of 7th Multinational Congress on Microscopy
MU Faculty or unit

Faculty of Science

Citation
Field Plasma physics
Keywords electron microscopy; carbon nanostructures; plasma
Description Carbon nanostructures studied in this work were prepared by two methods. In both cases they were grown on Si substrates with Fe catalysts. As a first method, microwave plasma torch at atmospheric pressure was used, in second case CNTs were grown employing an inductively coupled plasma chemical vapor deposition (ICP-PVD). For microstructural studies, a Jeol JSM 6460 scanning electron microscope (SEM) with an Oxford Instruments INCA Energy analyser (EDX) and a Philips CM12 STEM transmission electron microscope (TEM) with an EDAX analyser were used.
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