Electron Density and Ion Flux in Diffusion Chamber of Low Pressure RF Helicon Reactor
| Authors | |
|---|---|
| Year of publication | 2006 |
| Type | Article in Proceedings |
| Conference | WDS'06 Proceedings of Contributed Papers, Part II |
| MU Faculty or unit | |
| Citation | |
| Field | Plasma physics |
| Keywords | Langmuir probe; planar probe; ion flux; electron density |
| Description | The electron density, ion flux and argon emission lines were measured in a radio frequency helicon reactor for different static magnetic field amplitude and low rf powers using cylindrical Langmuir probe, planar probe and optical emission spectroscopy (OES). The static magnetic field amplitude created around the plasma source varied from 0 to 10 mT in the helicon source and from 0 to 1.4 mT in the diffusion chamber. The discharge was created in argon and oxygen at 0.7 Pa with rf powers, between 50 and 600 W, applied to the helicon antenna. The variations of the electron density, ion flux taken from Langmuir probe measurement and from planar probe measurement and Ar 750 nm line intensity with the rf power were in good agreement. Hence, it is concluded that the maximum of electron density observed in the diffusion chamber for the highest values of magnetic field is likely to be due to some confinement of the plasma in the source. Measurements in oxygen discharge showed slightly different results. |
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