Study of Attachment and Detachment Reactions in Flowing Afterglow via Computer Simulation
| Authors | |
|---|---|
| Year of publication | 2007 |
| Type | Article in Proceedings |
| Conference | 16th Symposium on Application of Plasma Processes |
| MU Faculty or unit | |
| Citation | |
| Field | Plasma physics |
| Keywords | attachment; detachment; flowing afterglow; computer simulation |
| Description | In the present contribution attachment and detachment reactions of electrons on C6F5Cl molecule at two temperatures 467 K and 550 K are studied. These reactions were originally studied in so Flowing Afterglow Langmuir Probe (FALP) apparatus [1]. The measured data, i. e., time evolution of the electron concentration, and the attachment/detachment coefficients determined from the experiments were compared with our simulation results. |
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