Complex analysis of SiOxCyHz films deposited by an atmospheric pressure dielectric barrier discharge

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Authors

SCHÄFER Jan HORN Stefan FOEST Rüdiger BRANDENBURG Ronny VAŠINA Petr WELTMANN Klaus-Dieter

Year of publication 2011
Type Article in Periodical
Magazine / Source Surface & Coatings Technology
MU Faculty or unit

Faculty of Science

Citation
Doi http://dx.doi.org/10.1016/j.surfcoat.2011.03.124
Field Plasma physics
Keywords SILVER NANOPARTICLES; PLASMA; JET
Description SiOx films are deposited with an atmospheric pressure dielectric barrier discharge (apDBD) using Ar, O2 and different precursor gases (HMDSO and Silane).An experimental study on the influence of the discharge operation parameters on the chemical composition of the deposited films and the vertical structure over the film thickness is carried out by means of SEM, EDX, and ATR–FTIR.
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