Understanding of hybrid PVD-PECVD deposition process – titanium magnetron sputtering in argon and acetylene

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Authors	SCHMIDTOVÁ Tereza SOUČEK Pavel VAŠINA Petr
Year of publication	2011
Type	Conference abstract
MU Faculty or unit	Faculty of Science
Citation
Description	Hybrid PVD-PECVD process of titanium magnetron sputtering in argon and acetylene atmosphere combines aspects of both conventional techniques: sputtering of titanium target (PVD) and acetylene as a source of carbon for polymerization (PECVD). It has been used for deposition of nanocomposite material consisting of nanocrystallites of titanium carbide embedded in hydrogenated carbon matrix (nc-TiC/a-C:H) which is an industrially attractive material for protective coatings. The aim of this contribution is to describe and understand elementary processes influencing the deposition process. Evolution of discharge voltage and current, pressure and selected spectral line intensities as a function of acetylene supply flow is reported.
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