Analysis of the boundaries of ZrO2 and HfO2 thin films by atomic force microscopy and the combined optical method
| Authors | |
|---|---|
| Year of publication | 2002 |
| Type | Article in Periodical |
| Magazine / Source | Surface and Interface Analysis |
| MU Faculty or unit | |
| Citation | |
| Web | http://www.physics.muni.cz/~franta/bib/SIA34_559.html |
| Field | Solid matter physics and magnetism |
| Keywords | ZrO2 and Hfo2 films; AFM; optical methods; rough upper boundaries |
| Description | In this paper an atomic force microscopy analysis of the microrough upper boundaries of ZrO2 and HfO2 thin films is presented. Within this analysis the values of the width, root-mean-square value of heights and power spectral density function of these boundaries are determined for ZrO2 and HfO2 exhibiting different thicknesses. The thickness dependences of the quantities mentioned are introduced. The values of the thicknesses of the films are evaluated using the combined optical method. This optical method is also used to describe boundary microroughness within the effective medium theory. A discussion of the results concerning the microroughness of the upper boundaries of both the ZrO2 and HfO2 thin films is also introduced. |
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