Project information
Plasmachemical depositions and plasmachemical treatment of surfaces of solid state substrate
- Project Identification
- OC 527.20
- Project Period
- 1/2000 - 12/2005
- Investor / Pogramme / Project type
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Ministry of Education, Youth and Sports of the CR
- COST
- MU Faculty or unit
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Faculty of Science
- prof. RNDr. Jan Janča, DrSc.
The aim of the project is to study processes running during plasma polymerization, co-polymerization and modification of surfaces of solid state substrates by plasmas. The diagnostics of the reactive plasma will be realized in a special high vacuum reactor by various tools - optical emission spectroscopy, actinometry, mass spectrometry, probes. Protective coatings prepared from various mixtures of monomers and gases like oxygen, argon, methane and deposited on plastic materials as to their optical and mechanical properties. The study (by ESR) of DLC and composite CNx films in inductive coupled plasma will continue. Microcrystalline diamond and DLC films will be also prepared in the microwave reactor ASTEX. Properties of surfaces and deposited films will be investigated by ellipsometry, contact angle, AFM XPS, FTIR. The application of the APG discharge for surface treatment of fibrous material (textile, paper, ...) and new methos of restoration of archaeological artefacts will be studied, too.
Publications
Total number of publications: 92
2004
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Study of plasma processes in afterglow by means of electron spin resonance
Acta Physica Slovaca, year: 2004, volume: 54, edition: 2
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Study of the Fracture of Coating/Substrate Systems
J. Engineering MECHANICS, year: 2004, volume: 11, edition: 5
2003
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Deposition of Hard carbon films and Its Diagnostics
Proceedings of the XIVth SAPP, year: 2003
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Deposition of polymer films by rf plasma nozle at atmospheric pressure
XV Symposium on Physics of Switching Arc, Vol I, Contributed Papers, year: 2003
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Deposition of thin organosilicon polymer films in atmospheric pressure glow discharge
Proceedings of 16th ISPC, year: 2003
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Diamond Growth on silicon and WC-Co by microwave plasma chemical vapor deposition
Proceedings of contributed papers WDS'03, year: 2003
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Effect of the Discharge Conditions on the Mechanical Properties of the Plasma Deposited DLC:SiOx Films
Proceedings of SAPP XIV, year: 2003
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Electron density measurements in pulsed microwave discharge in nitrogen gas
Proceedings of contributed papers WDS'03, year: 2003
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Hard carbon films: Deposition and diagnostics
Acta Physica Slovaca, year: 2003, volume: vol. 53, edition: No. 5
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Increase od Dissociation Degree in Afterglow Due to Admixtures
Proceedings of the XIVth SAPP, year: 2003